Development of next generation solar cells by realizing the selective emitter using novel screen printing technologies Subproject: Novel screen printing technologies for manufacturing selective emitter solar cells
|German title:||Entwicklung der Solarzellen der nächsten Generation durch Realisierung des selektiven Emitters mittels neuartiger Siebdrucktechnologien Teilprojekt: Neuartige Siebdrucktechnologien zur Herstellung selektiver Emitter Solarzellen.|
|Duration:||1st September 2012 - 31st August 2014|
|Description:||The majority (86 % for 2010) of photovoltaic modules produced are based on crystalline silicon. Crystalline silicon photovoltaic modules are equipped to approx. 90 % with conventional screen-printed solar cells.
The further development of crystalline solar cells therefore continues to be of great technological and economic importance. The development towards higher solar cell efficiencies includes new metallization concepts as well as new structural designs of the solar cell, such as the use of selective emitters.
Selective emitters formed one solution approach. The production of selective emitter structures by means of screen printing has great potential for widespread application in industry, since the technology of screen printing is already known from the production of solar cell metallization.
Selective emitter solar cells are characterized by highly doped n++ regions under the metallization and low doped n+ regions between the metal fingers.
The goal of this project was to optimize these two regions. A low contact resistance between metallization and silicon was realized. On the other hand, the surface recombination was reduced and the sensitivity for ultraviolet light was improved.
|Project sponsor:||AiF Projekt GmbH|
|Funding code:||KF 2020411MU2|
|Contact:||Contact us about this project via our former business unit Silicon Detectors|
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