Under the motto “Sensor technology future trends and sensor impulses for industrial users” the Institute for Sensor and Actuator Technology of the Coburg University of Applied Sciences invites to the already 3rd Technology Day Applied Sensor Technology (TAS). On 9th March 2023, the CiS Research Institute participates with a technical lecture and a place in the accompanying exhibition
At the GREAT H2 technical forum in the Arena Erfurt on Nov. 16, 2022, Dr. Thomas Frank, head of the MEMS department at the CiS Research Institute, will present an H2-Semicron® gas sensor system for measuring hydrogen concentrations in plants such as electrolysers and storage systems. The sensor system is a joint development with UST Umweltsensortechnik GmbH
The new project focuses on the creation of interfaces to link different existing design and simulation tools, using the development of high-precision and long-term stable pressure sensors at the CiS Research Institute as an example
The new R&D project miniOffset focuses on the development of a silicon-based piezoresistive technology platform with minimal bridge base detuning. The basis is formed by CMOS/MEMS-compatible materials combined with cost-effective manufacturing processes
In the 2nd edition of the CiS Workshop on October 13, 2022, experts from industry and science exchanged views on current development trends in piezoresistive silicon pressure sensors. Also, don’t miss the next CiS Workshop on 9th November on NDIR sensors and components
Dr. Heike Wünscher will report on “Energy storage by water electrolysis” at the technology conference elmug4future tomorrow in Friedrichroda. In addition, the CiS Research Institute is in charge of the booth of the growth core HIPS (High Performance Sensors) in the accompanying exhibition
In her congress contribution at ACHEMA, Dr. Heike Wünscher from the MEMS department at the Cis Research Institute, presents research results for the passivation of silicon-based MEMS sensors and their use as flow sensors in harsh environments
For infrared emitters with blackbody properties, the CiS Research Institute developed a simplified manufacturing process. It produces a performance-enhancing micro-texture. The patent PCT/EP2018/083263 has been granted for this
The focus of the new research project is the development of a technology for sensors with flush media connection and strict separation to the electrical side for applications in the high-pressure range up to 300 MPa
A significant reduction in calibration costs is achieved by means of an optimized layout of a measuring bridge with piezoresistive measuring resistors and use of the longitudinal effect in the project “Pressure sensor made of <110> silicon with increased linearity”
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Germany
Tel.: +49 361 663 1410
E-Mail: info@cismst.de
