In the SiDMeses research project, the long-term stability of hybrid silicon strain sensors was significantly improved by a targeted and accelerated reduction of the mechanical assembly stress and a precise, extremely parallel and symmetrical structure was generated
The new research project NivLer at the CiS Research Institute addresses the development of a retrofit kit for non-invasive pressure measurement in process pipes in order to be able to non-destructively record and digitize various condition variables
In the new project Cryo-Resistance both the further development of industrially manufactured resistance thermometers in cooperation with UST Umweltsensortechnik GmbH and several layout variants based on semiconductor technologies of the CiS Research Institute are pursued
“Microtechnologies for a smart world” is the slogan of this year’s IVAM Hightech Summit in Bochum on 3rd & 4th May 2023. Prof. Thomas Ortlepp will moderate the session “Smart Mobility” and open the discussion with the presentation “MEMS Development for Smart Mobility – Driver Condition Monitoring for Safety”
In the freezing-out project, quantum mechanical calculations and extensive measurements were performed on semiconductors in the temperature range from 300K to 4K. This served to put future simulations in the MEMS area and the semiconductor industry in this temperature range on a better data basis and to make them more reliable
At the GREAT H2 technical forum in the Arena Erfurt on Nov. 16, 2022, Dr. Thomas Frank, head of the MEMS department at the CiS Research Institute, will present an H2-Semicron® gas sensor system for measuring hydrogen concentrations in plants such as electrolysers and storage systems. The sensor system is a joint development with UST Umweltsensortechnik GmbH
The new R&D project miniOffset focuses on the development of a silicon-based piezoresistive technology platform with minimal bridge base detuning. The basis is formed by CMOS/MEMS-compatible materials combined with cost-effective manufacturing processes
In the 2nd edition of the CiS Workshop on October 13, 2022, experts from industry and science exchanged views on current development trends in piezoresistive silicon pressure sensors. Also, don’t miss the next CiS Workshop on 9th November on NDIR sensors and components
The focus of the new research project is the development of a technology for sensors with flush media connection and strict separation to the electrical side for applications in the high-pressure range up to 300 MPa
A significant reduction in calibration costs is achieved by means of an optimized layout of a measuring bridge with piezoresistive measuring resistors and use of the longitudinal effect in the project “Pressure sensor made of <110> silicon with increased linearity”
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